$\hbox{SnO}_{2}$ Nanorods Prepared by Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition

SnO
₂
nanorods were successfully deposited on substrate by inductively coupled plasma-enhanced chemical vapor deposition (PECVD) using dibutyltin diacetate (DBTDA) as the precursor. Each of the SnO
₂
nanorods in situ grown under catalyst- and template-free growth condition and without any substrate heating was found to be [110] oriented single crystal. These needle-shaped nanorods have an average diameter between 5 and 16 nm and a length of 160 to 250 nm from TEM observation. Substrate distance and RF power showed notable effects on the formation of SnO
₂
nanorods.