Development of Ag Alloy Thin Film With Both High Reflectance and Adhesion for High Density Opt-Electronic Module

We have developed a new multilayered reflection film structure containing Ag films for achieving slab waveguide based optical transmission interconnections between large scale integrated chips for next generation high-speed computers. We applied Cr to both adhere the Ag to the SiO
₂
optical layer and to inhibit diffusion of Ag into SiO
₂
. Although we found that Cr tends to decrease the reflectance, we found that it is possible to satisfy both adhesiveness and reflectance requirements by adjusting the film thickness