Fabrication of 3-D submicron glass structures by FIB

The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high sensitivity, high material removal rates, low forward scattering and direct fabrication in selective area without any etching mask, etc. In this study, FIB etched Pyrex glass was used for fast fabrication of 3D submicron structures. A high aspect-ratio (HAR) glass structure of 5 (1.97mum depth/0.39 mum width) was fabricated. The experimental results in terms of limiting beam size, ion dose (ion/cm
²
), beam current, etc. was discussed. The influence of XeF
₂
gas on FIB glass fabrication was investigated.