Three-dimensional Electrochemical Micromachining on Metal and Semiconductor by Confined Etchant Layer Technique (CELT)

We developed a technology for three dimensional (3D) electrochemical micromachining. The confined etchant layer technique (CELT) has been applied to achieve effective three-dimensional (3D) micromachining on different kinds of metals and semiconductors. This technique operates on the basis of indirect electrochemical process, and is a low-cost technique for microfabrication of arbitrary 3D structures in a single step.