Analysis of Electric Stress Distribution in Cavities embedded within Dielectric Structures

Electric stress distribution within dielectric cavities are studied using the finite-element numerical technique. The results indicate that the electric stress is enhanced within a gas-filled cavity embedded in the dielectric. The amount of stress enchancement and the electric field distribution within the dielectric are significantly influenced by the dielectric permittivity, the dimensions of the cavity, the number of cavities in series within the dielectric gap, the cavity orientation, the dielectric thickness (electrode spacing), the contour of the edge of the electrodes, and the presence of floating electrodes near electrode edges. The effect of various parameters on the stress distribution within a dielectric is important in the design, fabrication, and testing of devices made of multi-layered dielectric/electrode film structures.