Impact of Lithographic Grid Irregularity Assessed on Photonic Crystal Device Selectivity

The gridding irregularities of electron beam lithography may deterministically disorder photonic crystals (PhC). Their practical impact is addressed on a PhC wavelength selective device using a large grid size of 8 nm. The device operation, based on confined resonances and propagation mini-stopbands in a multimode waveguide, is deterministically blurred. Scattering length scales are correspondingly discussed. Strategies for higher throughput lithography are proposed accordingly