The photoinduced metallo-organic decomposition process: a novel technique for dielectric thin-film growth

A novel photoinduced metallo-organic decomposition (PIMOD) process has been developed for growing high-quality lithium niobate films on silicon or sapphire substrates. Crack- and interdiffusion-free films have been grown by the PIMOD process at a lower temperature for a shorter processing time than those required for the conventional MOD process. The electrical, optical, and electrooptical properties of the PIMOD-derived films are reported.<
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