Simple implementation of a first order advanced process control engine for thin film applications

PECVD of dielectric films show two major variation sources (lot-to-lot variation and device-to-device variation) that reduce the process Cpk and increase the cost of operation. To improve the PECVD process manufacturability, some form of automated compensation at runtime is necessary. This paper presents a first order APC engine that compensates for process tool deposition rate drift and pattern density differences. Both are needed to allow for a single recipe to deliver 'on target' performance for many devices and process tools. This project improved Cpk from /spl sim/1.0 to over 2.0.