The p-n junction quantum well APD: A new solid-state photodetector for lightwave communications systems and on-chip detector applications

A novel variation on the doped quantum well avalanche photodiode is presented that provides comparable signal-to-noise performance at more realizable material doping requirements. The device consists of repeated unit cells formed from a p-n Al
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In
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As junction immediately followed by near-intrinsic Ga
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As and Al
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As layers. As in the doped quantum well device, the asymmetric unit cell selectively heats the electron distribution much more than the hole distribution prior to injection into the narrow-gap Ga
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In
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As layer in which impact ionization readily occurs. The effects of various device parameters, such as the junction doping, Ga
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As and intrinsic Al
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As layer widths as well as the overall bias on the electron and hole ionization rates, is analyzed using an ensemble Monte Carlo method. From the determination of the ionization rates and the ionization probabilities per stage, P and Q, an optimal device design can be obtained that provides high gain at low multiplication noise. In addition, a structure that operates at less than 5 V bias is presented that can provide moderate gain at very low noise. It is expected that the device designs presented herein can serve either as high-gain low-noise detectors for lightwave communications systems or as moderate-gain low-noise detectors for on-chip application.