A tunneling emitter bipolar transistor

We propose a new device-a Tunneling Emitter Bipolar Transistor (TEBT)-where the enhancement of the emitter injection efficiency is achieved by utilizing a very large difference in the tunneling probabilities for electrons and holes in a thin doped graded AlGaAs layer. This layer is inserted between the n-type GaAs emitter and p-type GaAs base. This device should have a high emitter efficiency and low parasitic resistances.