Excimer laser projection lithography on a full-field scanning projection system

Optical projection lithography using an excimer laser light source is demonstrated on a commercial state-of-the-art full-wafer scanning 1x projection system. Images are printed on 125-mm-diameter wafers on a Perkin-Elmer Model 500 projection printer using an XeCl laser operating at 308 nm. Near-vertical image profiles and 1-µm resolution are experimentally demonstrated. The anamorphic optical transformation system necessary to transform the collimated, nearly rectangular excimer laser beam into the arc-shaped, effectively self-luminous illumination required by the projection system is also described.