Junction field-effect transistors using In0.53Ga0.47As material grown by molecular beam epitaxy

In this article we discusss the fabrication of junction field-effect transistors (JFETs) using In
0.53
Ga
0.47
As grown p-n junction material prepared by molecular beam epitaxy (MBE). For an n-channel doping of 2 × 10
¹⁶
cm
^-3
and a gate length of 2.0µm, these devices are shown to have a transconductance of 50 mS/mm with a corresponding internal transconductance of 67 mS/mm.