Nano-patterning using an embedded particle monolayer as an etch mask

A new nano-fabrication technique using a self-assembled nano-particle monolayer as an etch mask is presented. We developed the embedded particle monolayer (EPM) method that forms a homogeneous particle monolayer over a large area. A periodic nano-cone pattern was fabricated by transferring the pattern of the particle monolayer onto the substrate. The nano-fabrication method developed here expected to be a useful tool for producing devices that require a periodic structure of nanometer scale such as a moth-eye antireflection surfaces [ 1], two-dimensional gratings, patterned magnetic media, and so on.