Fabrication of low line edge roughness mold by SOG replica method

Atomic force microscopy (AFM) is a promising measurement method for critical dimension (CD) below 100 nm because of higher resolution and lower damage in comparison with scanning electron microscopy (SEM). In the development of CD-AFM, fine standard patterns, which have low line edge roughness (LER) and sharp vertical sidewalls, are required for evaluation of CD-AFM performance.