Control of selective and blanket ruthenium film deposition chemistry in supercritical CO/sub 2/ fluid chemical deposition

Supercritical CO2 (scCO2) is a compressive fluid that behaves like both a gas and a liquid. ScCO2 possesses unique properties such as a high diffusivity, a high molecular number density, zero surface tension, and solvent capability. A considerable attention is now paid to using supercritical CO2 (scCO2) for semiconductor processing from wafer cleaning to drying. Thin film growth from scC02 fluids has been recently of crucial because of its superb characteristics such as nano filling capability, perfect conformability, good film quality, and high growth rate. We have demonstrated deposition of Cu and Ru thin films in nano features [ 1,2].