Demonstration of charge-coupled devices in fully depleted SOI

This paper discusses on demonstration of charge-coupled devices in fully depleted SOI. CCDs implemented in FDSOI are expected to operate up to higher speeds than conventional bulk surface-channel CCDs. While FDSOI CCDs retain the high linearity and charge storage density of surface-channel CCDs, the buried oxide (BOX) layer allows strong fringing electric fields to penetrate beneath the gates and accelerate the transfer of charge from gate to gate. The simulation results illustrate the speed improvement with increasing BOX thickness. The improvement saturates when the BOX thickness becomes comparable to the gate length.