Fabrication sub-micron gratings based on embossing

We demonstrated two kinds of sub-micron gratings fabricated by embossing method from anisotropically etched silicon molds. One kind of grating is a line grating with a pitch of 500 nm; the other kind is grating array with a pitch of 200 nm. We investigated the feasibility of the fabrication method for the micro fabrication of the high aspect ratio silicon molds: that is for fabricating molds by using electron beam lithography plus fast atom beam (FAB) etching. The replication yield, repeatability and efficiency from the original master are good. This technique can also be used to fabricate other sub-micron scale structures.