Sub-atmospheric chemical vapor deposition (SACVD) of TEOS-ozone USG and BPSG

Summary form only given. TEOS and ozone based USG and BPSG deposited by subatmospheric CVD (SACVD) have shown good film properties and planarization abilities on high-aspect-ratio structures. The SACVD reactor is capable of operating from low pressure to nearly atmospheric pressure and also in plasma mode. SACVD USG and SACVD BPSG using trimethylborate (TMB) and triethylphosphite (TEP) as dopants are described. In addition, in-situ integration of SACVD, plasma-enhanced CVD (PECVD), and etchback processes is discussed.<
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