Modelling fusible CVD glass planarization flow contours

A comparison between experimental and simulated fusible chemical vapor deposition (CVD) glass planarization flow contours is presented. The simulated contours assume Newtonian viscous flow and a hydrostatic pressure gradient caused by the surface tension and the radius of curvature of the contour. At long flow lengths, >or=100 mu m, reasonable agreement between experiment and simulation is obtained. Assuming no change in film surface tension, the flow rate constant increase is directly related to a tenfold decrease in film viscosity at the higher flow temperature.<
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