Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 /spl mu/m

Seven-functional-layer 3D photonic crystals with midgap wavelength at 1.55 /spl mu/m were fabricated with a layer-by-layer approach. We employed e-beam lithography to align and define the pattern, reactive-ion-etching to transfer the pattern, and spin-on-dielectrics to planarize the surface. Four such cycles were sufficient to complete the fabrication.