X3D: 3D X-ray lithography and development simulation for MEMS

We report a novel simulation tool covering the complete process of X-ray lithography. Sub-steps of the procedure are mask generation, transient exposure, and transient resist dissolution. For the first time, accurate monolithic simulation of exposure and development for device-sized domains is possible. This provides the means for design and process verification and optimization for today's complex moving mask systems, including those using multiple simultaneously moved masks.