Optimization of transient temperature uniformity in RTP systems

Independent, dynamic control of multiple lamps in a rapid thermal processing (RTP) system is a potential solution to the problem of transient wafer temperature nonuniformity. The author addresses the problem of minimizing temperature error during transients when independent control of lamp power settings is available. He presents a technique based on linear programming for minimization of worst case error during temperature trajectory following, given a model of an axisymmetric, multilamp RTP system.<
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