The effects of deposition parameters on iron films RF diode sputtered in argon-nitrogen

Iron-nitrogen films deposited in an argon-N/sub 2/ sputtering gas were characterized as a function of RF diode sputtering parameters and the N/sub 2/ partial pressure. The magnetic properties of the films were generally soft until they contained about 1 at.% nitrogen, which corresponded to an impingement rate ratio of nitrogen to iron of about 400 to 1. At that composition H/sub c/ and H/sub k/ increased abruptly. Optimum substrate bias was found to depend on the substrate used. Annealed films exhibited significant decreases in H/sub c/ and H/sub k/, and the saturation magnetostriction could be adjusted to near zero by adding nitrogen. Corrosion properties were also improved with added nitrogen.<
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