Intense pulsed ion-beam ablation for material applications

Summary form only given, as follows. The intense pulsed ion beam is used to generate high-density, high-temperature ablation plasma. This ablation plasma has potential applications in material development such as thin-film deposition and nanosize material synthesis. We studied the processes of ion-beam energy deposition and ablation plasma expansion by using the diagnostic techniques of calorimetry and high-speed photography. The results are used to investigate the ablation plasma characteristics that are very important issues in material applications.