Applications of Atomic Layer Deposition in Energy Devices

Atomic Layer Deposition (ALD) is a nanoscale deposition technique owing to its ability to fabricate films at a controllable sub-nanometer (usually sub-angstrom) rate and to coat structures that are highly porous and/or tortuous. A variety of applications, including dynamic random access memory, lithium-ion batteries and field-effect transistors, etc, have emerged using deposited materials by ALD. Particularly, interfacial engineering by ALD has led to exciting understanding of interface and surface for solar cells and Li ion batteries. The rising number of scientific publications on ALD per year testifies to the increasing world-wide interest towards ALD technology.