Abstract:
The effects of top metal contacts on the leakage current and breakdown characteristics of HfO2 metal-insulator-metal (MIM) capacitors were investigated. It is found that ...Show MoreMetadata
Abstract:
The effects of top metal contacts on the leakage current and breakdown characteristics of HfO2 metal-insulator-metal (MIM) capacitors were investigated. It is found that the breakdown field strength of the devices scales with the work function of the top electrode; the higher the metal work function the higher the breakdown field strength of the devices. This observation is attributed to the different barrier height formed at the contacting metal/HfO2 interfaces, which results in various amount of charge injected into the HfO2 dielectrics. The joule heating from these injected charges increases the defect density leading to dielectric breakdown.
Published in: 2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)
Date of Conference: 15-17 December 2010
Date Added to IEEE Xplore: 14 February 2011
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