Carbon thin films deposition by KrF Pulsed Laser at different temperatures

In this paper, carbon thin films were prepared by KrF pulsed laser deposition at 20 °C and 300 °C. The surface morphology were characterized by atomic force microscopy (AFM). The nature of bonding of carbon thin films deposited at different temperatures has been done by using technique Fourier infrared transformation spectroscopy (FTIR).