Platinum silicide metallic source & drain process optimization for FDSOI pMOSFETs

We report on the development of a metallic source and drain module for FDSOI pMOSFETs including lateral PtSi formation, Ti/TiN barrier, optimized doping conditions, controlled PtSi penetration below spacers and suitable cleaning of the PtSi surface prior to barrier deposition. Mean specific contact resistivity values lower than 2 Omega mum
²
have been achieved, which leads to highly performant pMOSFET devices (I
_on
= 345 muA.mum
^{- 1}
/I
_off
= 30 nA.mum
^-1
at -1V for 50 nm gate length).