New UV Resists with Negative or Positive Tone

Many polymeric resist materials that have been described function on the basis of radio-chemically induced scissioning or crosslinking process that results in a change in the molecular weight of the polymer in the exposed regions. The function of the classical Shipley AZ-type photoresists is based on radiation induced structural transformation of a photoactive compound, which results in great alteration of its efficiency as a dissolution rate inhibitor.