System Requirement Analysis of Laser Interference Nanolithography

This paper presents a system requirement analysis of multi-beam laser interference nanolithography for nanoscale structuring of materials including seven sections: introduction, formation of multi-beam laser interference patterns, user requirements, system architecture, experiments, discussions and conclusions. Analytical expressions were obtained for the spatial distribution of radiation of the interfering beams as a function of their amplitudes, phases, angles of incidence on the sample, and polarization planes with computer simulation and experimental results. The environmental effect and technological potential were also discussed.