Modeling of Evaporation of Thin Films Using DOE

Evaporation of thin films is widely spread technology. The goal of the work has been to optimize a process of fabrication of thin resistive Ni films. Mathematical models for calculation of thickness and resistance of the films have been created. A method of design of experiments has been used for design of the models. Three types of models have been designed and tested: a linear model, a combined one and a short combined one. First the models have been verified using an F-test. It has been found that a linear model is not satisfactory, therefore it has been rejected. Subsequently remaining two models have been verified by complementary experiments, when calculated values and values measured on newly fabricated films have been compared. It has been found an excellent conformity among calculated and measured values (plusmn 3%). Then the optimum fabrication conditions have been found by optimization of the models.