Transparent all organic TFT fabrication by low cost process without clean room

Here is studied a process for the fabrication of a transparent all Organic Field Effect Transistor (OTFT) in a low cost way, without clean room. A major difficulty lies in the fact that substratum is CR39®, an organic glass. Pentacene, PMMA, and ITO are implemented as respectively semiconductor, insulator, and materials for source, drain and gate electrodes. In preliminary results, Ion Beam Sputtering (IBS) is used as technique for ITO deposition. Transistors characteristics are discussed. To improve the characteristics and increase the reproducibility, a DC Magnetron process is proposed for the ITO deposition on CR39®. Transparency and conductivity of the ITO layer obtained by this method are presented and discussed.