Synchrotron radiation masking on asymmetric 6.5 x 4.3-GeV B-Factory

Synchrotron radiation background rate was investigated in the recently proposed project of the asymmetric 6.5-GeV*4.3-GeV B-factory with monochromization. The method used was Monte Carlo simulations of the absorption and reradiation of photons in the primary masks, secondary mask-shaded primary masks, and so on. With the proposed mask scheme, an acceptable background level in the silicon vertex chamber of about 8*10/sup 6/ photons/s was obtained.<
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