Monolithic integration of high voltage driver circuits and MEMS actuators by ASIC-like postprocess

In this paper, we report monolithic integration of MEMS (micro electro mechanical systems) actuators and high-voltage driver circuits into a silicon chip. Driver circuits of up to 40 V were prepared on an 8-/spl mu/m-thick SOI (silicon-on-insulator) wafer by the DMOS (double-diffused metal oxide semiconductor) processes, after which MEMS electrostatic actuators were integrated into an identical SOI layer by post-processing using DRIE (deep reactive ion etching). This technique opens up a new way of high-voltage ASIC (application specific integrated circuit) for MEMS designer. As a prototype application model, we have developed microlens optical scanners and other elementary MEMS electrostatic actuators with multi-channel driver circuits.