Large scale magnetrons for sputtering of thick CoCr and NiFe targets

For high rate sputtering of ferromagnetic materials a new magnetron system has been developed, allowing typical target thicknesses up to 14 mm. The general layout of this "Interpoles target for ferromagnetic materials" (IPT/F) is described and data about its sputter performance are given. The system has been tested in production with cathodes of 1.45 m length. Targets of CoCr and NiFe have been used with a thicknes of 10 mm. Maximum power densities of 50 W cm
^-2
(30 W cm
^-2
) could be applied in long time operation with the CoCr (NiFe) target. This results in maximum deposition rates of 185 A/s for CoCr and 110 A/s for NiFe. The plasma nearly homogeneously covers a large area of the target. This leads to a target utilization of more than 50%.