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		<title><![CDATA[ Nanotechnology, IEEE Transactions on - new TOC ]]></title>
		<link>http://ieeexplore.ieee.org</link>
		<description>TOC Alert for Publication# 7729 </description>
		<year>2012</year>
		<month>February </month>
		<day>10</day>
		<item>
			<title><![CDATA[Table of Contents]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122890]]></link>
			<description><![CDATA[ ]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122890]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>C1</startPage>
			<endPage>C1</endPage>
			<fileSize>196</fileSize>
			<authors><![CDATA[]]></authors>
		</item>
		<item>
			<title><![CDATA[IEEE Transactions on Nanotechnology publication information]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122893]]></link>
			<description><![CDATA[ ]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122893]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>C2</startPage>
			<endPage>C2</endPage>
			<fileSize>40</fileSize>
			<authors><![CDATA[]]></authors>
		</item>
		<item>
			<title><![CDATA[Table of Contents]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122891]]></link>
			<description><![CDATA[ ]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122891]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>1</startPage>
			<endPage>2</endPage>
			<fileSize>189</fileSize>
			<authors><![CDATA[]]></authors>
		</item>
		<item>
			<title><![CDATA[Graphene/Carbon Nanotube Films Prepared by Solution Casting for Electrochemical Energy Storage]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5892894]]></link>
			<description><![CDATA[Graphene oxide/carbon nanotube (GO/CNT) films with different CNT contents were prepared by a solution-casting method. The oxygen-containing groups on the GO/CNT films were removed by thermal annealing at 200&#x00B0;C and the corresponding hybrid graphene/CNT films were obtained. The graphene/CNT films have good mechanical and electrical properties as well as high stability in electrolyte due to the combination of the film-formation capability of graphenes and the excellent mechanical and electrical properties of CNTs. These graphene/CNT films could be directly used as a supercapacitor electrode without assistance of any binders and metal current collectors, demonstrating good electrochemical capacitance performance with the specific capacitance of 70-110 F/g at a low scan rate of 1 mV/s.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5892894]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>3</startPage>
			<endPage>7</endPage>
			<fileSize>681</fileSize>
			<authors><![CDATA[Juan-Juan Li;Yan-Wen Ma;Xu Jiang;Xiao-Miao Feng;Qu-Li Fan;Wei Huang;]]></authors>
		</item>
		<item>
			<title><![CDATA[Resistive Programmable Through-Silicon Vias for Reconfigurable 3-D Fabrics]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5930369]]></link>
			<description><![CDATA[In this letter, we report on the fabrication and characterization of titanium dioxide (TiO<sub>2</sub>)-based resistive RAM (ReRAM) cointegration with 380 &#x03BC;m-height Cu through-silicon via (TSV) arrays for programmable 3-D interconnects. Nonvolatile resistive switching of Pt/TiO<sub>2</sub> /Pt thin films is first characterized with a resistance ratio up to five orders of magnitude. Then, cointegration of Pt/TiO<sub>2</sub>/Pt or Pt/TiO<sub>2</sub> memory cells on 140 and 60 &#x03BC;m diameter Cu TSVs is fabricated. Repeatable nonvolatile bipolar switching of the ReRAM cells is demonstrated for different structures.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5930369]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>8</startPage>
			<endPage>11</endPage>
			<fileSize>335</fileSize>
			<authors><![CDATA[Sacchetto, D.;Zervas, M.;Temiz, Y.;De Micheli, G.;Leblebici, Y.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Controlling the Interface Dynamics at Au Nanoparticle&#x2013;Oxide Interfaces]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5930367]]></link>
			<description><![CDATA[With interface sizes rapidly reducing to the nanometer scale, it has become vital to understand how size and structure can affect transport behavior between materials in order to tune the energy barrier for various applications. In this study, the fabrication of Schottky barriers between 20 nm Au nanoparticles and Nb-doped SrTiO<sub>3</sub> substrates is reported. The calculated barrier height and ideality factors are compared for dopant concentrations ranging over three orders of magnitude. The results show that the lowest doped substrates exhibit transport characteristics dominated by thermionic emission while the highest doped substrates are dominated by tunneling and the transition is best described by classical theory with the addition of edge effects to account for nonideal behavior.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5930367]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>12</startPage>
			<endPage>15</endPage>
			<fileSize>281</fileSize>
			<authors><![CDATA[Kraya, R.A.;Kraya, L.Y.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Localized Growth of Carbon Nanotubes on CMOS Substrate at Room Temperature Using Maskless Post-CMOS Processing]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5353709]]></link>
			<description><![CDATA[Carbon nanotubes (CNTs) have been successfully synthesized on foundry CMOS substrate using maskless post-CMOS surface micromachining and localized heating techniques. The integrated heater is directly made of gate polysilicon and suspended over a micromachined cavity for thermal isolation. The synthesized CNTs are connected to CMOS interconnect metal layers without the need of any metal deposition. It is experimentally verified that the electrical properties of the neighboring CMOS transistors are unchanged after CNT growth.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5353709]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>16</startPage>
			<endPage>20</endPage>
			<fileSize>488</fileSize>
			<authors><![CDATA[Ying Zhou;Johnson, J.L.;Ural, A.;Huikai Xie;]]></authors>
		</item>
		<item>
			<title><![CDATA[High-Efficiency Automated Nanomanipulation With Parallel Imaging/Manipulation Force Microscopy]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5404293]]></link>
			<description><![CDATA[The atomic force microscope (AFM) has been widely used to manipulate nanoparticles, nanowires, and nanotubes for applications such as nanostructure building, nanocharacterization, and biomanipulation. However, conventional AFM-based nanomanipulation is inefficient because of the serial scan-manipulation-scan process involved. In this paper, high-efficiency automated nanomanipulation with a parallel imaging/manipulation force microscope (PIMM) is presented. With the PIMM, image scan and nanomanipulation can be performed in parallel through the collaboration between two cantilevers: one cantilever acts as an imaging sensor and the other is used as a manipulating tool. Two automated manipulation schemes were introduced for normal- and high-speed image scanning, respectively. An automated parallel manipulation task is managed by system control software with multithread through a procedure of dynamic image processing, task planning, two-tip collaboration, and a controlled pushing manipulation with amplitude feedback from the cantilevers. The efficiency of automated parallel nanomanipulation with normal-speed image scanning was validated by building nanoparticle patterns.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5404293]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>21</startPage>
			<endPage>33</endPage>
			<fileSize>1240</fileSize>
			<authors><![CDATA[Hui Xie;Re&#x0301;gnier, S.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Nonlocal Continuum Modeling and Molecular Dynamics Simulation of Torsional Vibration of Carbon Nanotubes]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5708179]]></link>
			<description><![CDATA[This paper investigates the size effects in the dynamic torsional response of single-walled carbon nanotubes (SWCNTs) by developing a modified nonlocal continuum shell model. The purpose is to facilitate the design of devices based on CNT torsion by providing a simple, accurate, and efficient continuum model that can predict the frequency of torsional vibrations and the propagation speed of torsional waves. To this end, dispersion relations of torsional waves are obtained from the proposed nonlocal model and compared to classical models. It is seen that the classical and nonlocal models predict nondispersive and dispersive behavior, respectively. Molecular dynamics simulations of torsional vibrations of (6, 6) and (10, 10) SWCNTs are also performed, the results of which are compared with the classical and nonlocal models and used to extract consistent values of the nonlocal elasticity constant. The superiority and accuracy of the nonlocal elasticity model in predicting the size-dependent dynamic torsional response of SWCNTs are demonstrated.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5708179]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>34</startPage>
			<endPage>43</endPage>
			<fileSize>721</fileSize>
			<authors><![CDATA[Khademolhosseini, F.;Phani, A.S.;Nojeh, A.;Rajapakse, N.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Self-Aligned Carbon Nanotube Thin-Film Transistors on Flexible Substrates With Novel Source&#x2013;Drain Contact and Multilayer Metal Interconnection]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5738348]]></link>
			<description><![CDATA[This paper presents the development and characterization of self-aligned carbon nanotube thin-film transistors (CNT-TFT) on flexible substrates. The channel consisting of dense, aligned, 99% pure semiconducting single-walled CNT is deposited using the dip-coat technique on a sacrificial substrate and then transferred on the device substrate. The source, drain, and gate structures are formed by the ink-jet printing technique. A novel source-drain contact formation using wet droplet of silver ink prior to the CNT thin-film application has been developed to enhance source-drain contact with the CNT channel. Bending test data on CNT-TFT test structures show minimal change (less than 10%) in their performance. Moreover, a special multilayer metal interconnection technology is demonstrated for flexible electronics applications. Bending test data on via test structure show change in resistance by less than 5%.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5738348]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>44</startPage>
			<endPage>50</endPage>
			<fileSize>1118</fileSize>
			<authors><![CDATA[Pham, D.T.;Subbaraman, H.;Chen, M.Y.;Xiaochuan Xu;Chen, R.T.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Nonvolatile Memristive Switching Characteristics of TiO<formula formulatype="inline"> <img src="/images/tex/20073.gif" alt="_{bm 2}"> </formula> Films Embedded With Nickel Nanocrystals]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5738349]]></link>
			<description><![CDATA[Nickel nanocrystal (Ni-NC)-embedded titanium dioxide films have been deposited for nonvolatile resistive switching memory devices. The polycrystalline behavior of the films has been observed from the X-ray diffraction spectra. Tiny isolated Ni-NCs with an average size of 4 nm are observed for the 1000 &#x00B0;C, 5-min annealed samples. Stable, bipolar, nonvolatile, and bistable resistive switching states are observed for the optimized annealed Ni-NC-embedded devices with a low SET and RESET voltage of 0.8 and -0.2 V, respectively. A high resistance ratio (&gt;;10), good stability, and retention properties are observed for the nanocrystal sample. The role of thin Ni-NC layer on memory switching stability is discussed.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5738349]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>51</startPage>
			<endPage>55</endPage>
			<fileSize>553</fileSize>
			<authors><![CDATA[Panda, D.;Dhar, A.;Ray, S.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Reduction of CNT Interconnect Resistance for the Replacement of Cu for Future Technology Nodes]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5762615]]></link>
			<description><![CDATA[Replacement of Cu interconnects with carbon nanotubes (CNTs) has been hindered by the high resistance of the CNTs. In this paper, methods for reducing CNT interconnect sheet resistance are presented. Functionalization with electron accepting molecules decreased sheet resistance up to 60%, giving a minimum sheet resistance of ~55 &#x03A9;/sq. Alignment of CNTs within the interconnect further reduced resistance. In contrast to nonaligned fabrics, aligned CNT interconnects maintained a constant resistance as CNT line width decreased, demonstrating a path for scaling to smaller technology nodes. In addition, interconnects made with single-walled CNTs consistently showed lower resistance than those with multiwalled CNTs. Finally, a projected RC delay was calculated that demonstrates improved performance below the 45 nm technology node for CNTs compared to Cu. To achieve the desired RC delay improvement, the aspect ratio of the CNT interconnect should be scaled appropriately and combined with an additional reduction in CNT interconnect sheet resistance to 10 &#x03A9;/sq, which is feasible based on the functionalization and alignment methods presented here.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5762615]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>56</startPage>
			<endPage>62</endPage>
			<fileSize>947</fileSize>
			<authors><![CDATA[Ward, J.W.;Nichols, J.;Stachowiak, T.B.;Quoc Ngo;Egerton, E.J.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Multilevel 3 Bit-per-cell Magnetic Random Access Memory Concepts and Their Associated Control Circuit Architectures]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5762611]]></link>
			<description><![CDATA[Designs for two novel multilevel magnetic random access memory (MRAM) concepts are presented in this paper along with their associated control circuit architectures. Both the ChiralMEM and 3-D-MRAM concepts contain eight states with distinct electrical resistances, giving a 3 bit-per-cell capacity. Operation of the two memory concepts are presented along with designs for the circuitry in particular focusing on the conversion of three conventional binary bits to octal encoded data and the required sequence for writing eight states per cell using current-driven magnetic fields. Discrimination and subsequent conversion of the eight readout resistance levels back to three conventional binary bits are discussed along with the write sequence for controlling arrays of multibit memory cells.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5762611]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>63</startPage>
			<endPage>70</endPage>
			<fileSize>1282</fileSize>
			<authors><![CDATA[Cramman, H.;Eastwood, D.S.;King, J.A.;Atkinson, D.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Tuning Low-Spin to High-Spin Mn Pairs in 2-D ZnO by Injecting Holes]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5762612]]></link>
			<description><![CDATA[We have performed an ab initio theoretical investigation of substitutional Mn atoms in planar structures of ZnO, viz., monolayer [(ZnO)<sub>1</sub>] and bilayer [(ZnO)<sub>2</sub>] systems. Due to the 2-D quantum confinement effects, in those Mn-doped (ZnO)<sub>1</sub> and (ZnO)<sub>2</sub> structures, the antiferromagnetic (AFM) coupling between (nearest neighbor) Mn<sub>Zn</sub> impurities have been strengthened when compared with the one in ZnO bulk systems. On the other hand, we find that the magnetic state of these systems can be tuned from AFM to FM by adding holes, which can be supplied by a p-type doping or even photoionization processes. Whereas, upon addition of electrons (n-type doping), the system keeps its AFM configuration.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5762612]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>71</startPage>
			<endPage>76</endPage>
			<fileSize>547</fileSize>
			<authors><![CDATA[Miwa, R.H.;Schmidt, T.M.;Fazzio, A.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Magneto-Electric Coupling in a Multiferroic Tunnel Junction Functioning as a Magnetic-Field-Effect Transistor]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5772935]]></link>
			<description><![CDATA[A nanoscaled multilayered composite structure made of a ferroelectric tunnel capacitor attached to a magnetic sensor layer is studied using a Landau-Ginzburg thermodynamic model. The relation between the polarization and the mechanical load induced by the magnetic signal via electrostriction is established. Our results suggest that the spin-flip-induced resistance change of such a structure may reach hundreds of percents to orders of magnitude, which is sufficiently strong to allow its use as a magnetic-field-effect transistor.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5772935]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>77</startPage>
			<endPage>81</endPage>
			<fileSize>323</fileSize>
			<authors><![CDATA[Yan Zhou;Chung-Ho Woo;Zheng, Y.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Effects of Dielectric Constant on the Performance of a Gate All Around InAs Nanowire Transistor]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5779742]]></link>
			<description><![CDATA[The effects of gate dielectric constant on the performance of a gate all around indium arsenide (InAs) nanowire transistor are studied using a 3-D quantum simulation. The replacement of SiO by a high- dielectric improves the OFF-state current, the ON-state current, the ON/OFF current ratio, the inverse subthreshold slope, the channel transconductance, and the switching delay and degrades the power-delay product. The OFF-state current is mainly tunneling current and the high- gate dielectrics improve the device OFF-state performance by increasing the tunnel barrier length. On the other hand, the ON-state current is mainly thermal current and the high- dielectrics improve the device ON-state performance by reducing the barrier height. The gate capacitance is increased with high- dielectrics. However, the improved ON-state current with high- dielectrics makes the switching delay shorter and increases the power (V I) dissipation and power-delay product. Due to very small effective mass of electron in InAs, the quantum effect on threshold voltage is strong and the device with smaller cross section shows better ON-OFF and switching performance at the same gate overdrive voltage.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5779742]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>82</startPage>
			<endPage>87</endPage>
			<fileSize>818</fileSize>
			<authors><![CDATA[Alam, K.;Abdullah, M.A.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Pandemic Influenza Detection by Electrically Active Magnetic Nanoparticles and Surface Plasmon Resonance]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5778989]]></link>
			<description><![CDATA[Influenza A virus (FLUAV), the causative agent of influenza infection, has received extensive attention due to the recent swine-origin H1N1 pandemic. FLUAV has long been the cause of annual epidemics as well as less frequent but more severe global pandemics. Here, we describe a biosensor utilizing electrically active magnetic (EAM) polyaniline-coated nanoparticles as the transducer in an electrochemical biosensor for rapidly identifying FLUAV strains based on receptor specificity, which will be useful to monitor animal influenza infections and to characterize pandemic potential of strains that have transmitted from animals to humans. Pandemic potential requires human-to-human transmissibility, which is dependent upon FLUAV hemagglutinin (HA) specificity for host glycan receptors. Avian FLUAV preferentially bind to &#x03B1;2,3-linked receptors, while human FLUAV bind to &#x03B1;2,6-linked receptors. EAM nanoparticles were prepared by synthesizing aniline monomer around gamma iron (III) oxide (&#x03B3;-Fe<sub>2</sub>O<sub>3</sub>) cores, yielding 25-100-nm diameter nanoparticles that were structurally characterized by transmission electron microscopy and electron diffraction. The EAM nanoparticles were coated with monoclonal antibodies specific to H5N1 (A/Vietnam/1203/04). Specificity of binding between glycans and H5 was demonstrated. The biosensor results were correlative to supporting data from a surface plasmon resonance assay that characterized HA/glycan binding and &#x03B1;-H5 antibody activity. This novel study applies EAM nanoparticles as the transducer in a specific, portable, easy-to-use biosensor with great potential for disease monitoring and biosecurity applications.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5778989]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>88</startPage>
			<endPage>96</endPage>
			<fileSize>1287</fileSize>
			<authors><![CDATA[Kamikawa, T.L.;Mikolajczyk, M.G.;Kennedy, M.;Lilin Zhong;Pei Zhang;Setterington, E.B.;Scott, D.E.;Alocilja, E.C.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Nanomagnet Logic from Partially Irradiated Co/Pt Nanomagnets]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5875887]]></link>
			<description><![CDATA[This paper presents a computational study of logic devices built from single-domain Co/Pt nanomagnets, where magnetic properties of the dots are engineered by an inhomogenous focused ion beam (FIB) irradiation. We develop a micromagnetic model for such Co/Pt dots and show that their reversal behavior and coupling to neighboring dots can be precisely engineered by the dose and spatial distribution of the irradiation. We demonstrate that magnetic logic circuits and nonvolatile memory devices with attractive performance figures can be built from asymmetrically irradiated dots.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5875887]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>97</startPage>
			<endPage>104</endPage>
			<fileSize>624</fileSize>
			<authors><![CDATA[Xueming Ju;Wartenburg, S.;Rezgani, J.;Becherer, M.;Kiermaier, J.;Breitkreutz, S.;Schmitt-Landsiedel, D.;Porod, W.;Lugli, P.;Csaba, G.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Low Complexity Design of Ripple Carry and Brent&#x2013;Kung Adders in QCA]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5778988]]></link>
			<description><![CDATA[The design of adders on quantum dot cellular automata (QCA) has been of recent interest. While few designs exist, investigations on reduction of QCA primitives (majority gates and inverters) for various adders are limited. In this paper, we present a number of new results on majority logic. We use these results to present efficient QCA designs for the ripple carry adder (RCA) and various prefix adders. We derive bounds on the number of majority gates for -bit RCA and -bit Brent-Kung, Kogge-Stone, Ladner-Fischer, and Han-Carlson adders. We further show that the Brent-Kung adder has lower delay than the best existing adder designs as well as other prefix adders. In addition, signal integrity and robustness studies show that the proposed Brent-Kung adder is fairly well-suited to changes in time-related parameters as well as temperature. Detailed simulations using QCADesigner are presented.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5778988]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>105</startPage>
			<endPage>119</endPage>
			<fileSize>2395</fileSize>
			<authors><![CDATA[Pudi, V.;Sridharan, K.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Magnetic Tunnel Junction-Based Spintronic Logic Units Operated by Spin Transfer Torque]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5875889]]></link>
			<description><![CDATA[Magnetic tunneling junction (MTJ)-based programmable logic devices have been proposed and studied for future reconfigurable and nonvolatile computation devices and systems. Spin transfer torque (STT)-based switching has advantages in device scaling compared to the field-switching mechanism. However, the previously proposed MTJ logic devices have operated independently and, therefore, are limited to only basic logic operations. Consequently, the MTJ device has only been used as an ancillary device, rather than the main computation device. As a result, the full benefits of MTJ-based computation have not been explored. New designs are needed to accelerate the development of the MTJ-based logic devices. Specifically the realization of direct communication between the MTJ devices is crucial to fully utilize the MTJ devices in the circuits to implement more advanced logic functions. In this paper, new MTJ-based spintronic logic units (building blocks) for spintronic circuits using the STT switching mechanism have been proposed and investigated, which includes the designs of a basic STT-MTJ logic cell, a direct communication between the MTJ logic cells, a three-MTJ logic unit and a spintronic logic circuit acting as an arithmetic logic unit.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5875889]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>120</startPage>
			<endPage>126</endPage>
			<fileSize>625</fileSize>
			<authors><![CDATA[Xiaofeng Yao;Harms, J.;Lyle, A.;Ebrahimi, F.;Yisong Zhang;Jian-Ping Wang;]]></authors>
		</item>
		<item>
			<title><![CDATA[Fabrication and Characterization of Coaxial p-Copper Oxide/n-ZnO Nanowire Photodiodes]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5876323]]></link>
			<description><![CDATA[The deposition of copper oxide onto vertically well-aligned n-ZnO nanowires by sputtering and the fabrication of p-copper oxide/n-ZnO coaxial nanowire photodiodes are reported. It was found that we could change the copper oxidation number to obtain Cu<sub>2</sub>O/ZnO nanowire photodiode, Cu<sub>4</sub>O<sub>3</sub>/ZnO nanowire photodiode and CuO/ZnO nanowire photodiode by simply changing the O flow rate during deposition. It was also found that noise equivalent powers were 6.1 &#x00D7; 10<sup>-11</sup>, 3.8 &#x00D7; 10<sup>-10</sup>, and 7.2 &#x00D7; 10<sup>-8</sup> W while normalized detectivities were 6.35 &#x00D7; 10<sup>9</sup>, 1.02 &#x00D7; 10<sup>9</sup>, and 5.37 &#x00D7; 10<sup>6</sup> cmHz<sup>0.5</sup> W<sup>-1</sup> for the fabricated Cu<sub>2</sub>O/ZnO nanowire photodiode, Cu<sub>4</sub>O<sub>3</sub> /ZnO nanowire photodiode and CuO/ZnO nanowire photodiode, respectively.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5876323]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>127</startPage>
			<endPage>133</endPage>
			<fileSize>804</fileSize>
			<authors><![CDATA[Hsueh, H.T.;Chang, S.J.;Weng, W.Y.;Hsu, C.L.;Hsueh, T.J.;Hung, F.Y.;Wu, S.L.;Dai, B.T.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Thermal-Noise-Exploiting Operations of Single-Electron Majority Logic Circuits with Conventional Clock Signals]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5893947]]></link>
			<description><![CDATA[This paper describes a thermal-noise-exploiting single-electron majority logic circuit. The circuit is based on a single-electron majority logic circuit using an irreversible single- electron box that was proposed in 2003. To correctly operate the original circuit, unconventional two-step clock signals are needed to decide and hold logical outputs. Moreover, the temperature is set to 0 K because the circuit is very sensitive to thermal noise. This circuit uses conventional clock signals that lack the first step of the two-step clocks used for deciding the output, and the circuit is placed in a thermal-noise environment. The key for correct circuit operation is to base the circuit system on a model of noise- exploiting neural networks, i.e., the stochastic resonance system. The system can stochastically detect a weak input signal with the help of external noise. Thermal energy in the proposed circuit should compensate for lack of the first step of the two-step clocks. In this study, the thermal-noise-exploiting majority logic circuit was designed, and its operation was tested by using a Monte Carlo simulation. As a result, the circuit operation was evaluated, and the circuit performance was found to be improved by increasing the temperature to T &#x2264; 5 K, i.e., the proposed circuit can exploit thermal noise energy for correct operation.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5893947]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>134</startPage>
			<endPage>138</endPage>
			<fileSize>734</fileSize>
			<authors><![CDATA[Oya, T.;]]></authors>
		</item>
		<item>
			<title><![CDATA[On the Use of Silver Nanoparticles for Direct Micropatterning on Polyimide Substrates]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5898423]]></link>
			<description><![CDATA[This paper proposes a direct micropatterning process based on the growth of photoreduced silver nanoparticles onto polyimide substrates. The silver nanoparticles are found to have sufficient catalytic efficiency for subsequent electroless plating. Characterization of the process indicates that UV energy dose and heat treatment have to be traded off against photo and thermal degradation of the polymer substrate. Factors affecting the adhesion of the final electroless metal deposit are also discussed.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5898423]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>139</startPage>
			<endPage>147</endPage>
			<fileSize>1071</fileSize>
			<authors><![CDATA[Ng, J.H.-G.;Watson, D.E.G.;Sigwarth, J.;McCarthy, A.;Prior, K.A.;Hand, D.P.;Weixing Yu;Kay, R.W.;Changqing Liu;Desmulliez, M.P.Y.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Catalyst Activity Enhancement of PtRu/CB for Methanol Oxidation by Carbon Nanotube Doping]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5966346]]></link>
			<description><![CDATA[A hybrid support material for catalyst is proposed and studied in the paper. A small fraction of single-wall carbon nanotubes (SWCNTs) were added into commercial carbon black (CB)-supported PtRu electrocatalyst. Catalyst inks with different SWCNTs' doping concentrations were prepared, characterized, and investigated for methanol electrooxidation using cyclic voltammetry. Compared with the control group (no SWCNTs' doping), catalyst with a proper amount of SWCNTs' doping has five times catalytic activity enhancement for methanol oxidation for the same amount of PtRu loading. Catalyst films with different SWCNTs' doping concentrations were inspected with scanning electron microscope and transmission electron microscope. Results suggested that addition of a SWCNT into PtRu/CB altered the catalyst-supporting material from pure CB spheres to hybrid SWCNT-CB matrix and, therefore, significantly changed PtRu nanoparticles distribution, catalyst film morphology, and, consequently, the catalyst activity toward methanol oxidation. A proper fraction of SWCNTs will attract PtRu onto surrounding SWCNTs without causing aggregation, which improves the effective surface reaction area and catalyst activity for methanol oxidation. This hybrid catalyst-support matrix provides a solution to the challenging issue of catalyst dispersion and accessibility dilemma and is very promising as a highly efficient and cost-effective catalyst system.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5966346]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>148</startPage>
			<endPage>151</endPage>
			<fileSize>516</fileSize>
			<authors><![CDATA[Yuan Xu;Xin Li;]]></authors>
		</item>
		<item>
			<title><![CDATA[Modeling and Characterizing Initial Component Assembly in Templated Assembly by Selective Removal]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5978221]]></link>
			<description><![CDATA[This paper presents quantitative modeling and characterization of the initial assembly process that takes place during templated assembly by selective removal (TASR). The present model complements the earlier analytical treatment of TASR, which only described TASR's selective removal process. The model describes how the geometry of and interactions between the components and assembly substrate, along with the mean fluid flows, predict the circumstances under which fluid effects will successfully drive initial placement of components into the assembly sites. Experiments that confirm the model predictions are presented. These results are used to identify how scaling trends affect the effectiveness of TASR's initial assembly and selective removal processes.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=5978221]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>152</startPage>
			<endPage>159</endPage>
			<fileSize>571</fileSize>
			<authors><![CDATA[Sunghwan Jung;Eid, F.;Livermore, C.;]]></authors>
		</item>
		<item>
			<title><![CDATA[The Effect of Magnetic Field on Thick Ir(ppy)<formula formulatype="inline"> <img src="/images/tex/20074.gif" alt="_{\bf 3}">  </formula>: Ir(mpp)<formula formulatype="inline"> <img src="/images/tex/20074.gif" alt="_{\bf 3}"> </formula> Nonmagnetic Organic Transistor With Improved Performance by Film Deposition on Heated Substrate]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6031923]]></link>
			<description><![CDATA[In this paper, we examined the influence of magnetic field with different substrate temperatures during the deposition of the Ir(ppy):Ir(mpp) blend layer heterojunction organic nonmagnetic organic transistor. It is shown that substrate heating treatment during evaporation leads to a significant improvement in the nonmagnetic metal-base transistor performance mainly due to an increase in current gain and ON-to-OFF current ratio. This is attributed to the improvement of thermal energy. Upon heating the substrate to 110&#x00B0;C in the presence of magnetic field, current gain and ON-to-OFF current ratio of 281 and 3.30 &#x00D7; 10<sup>6</sup> were obtained compared to 219 and 2.06 &#x00D7; 10<sup>6</sup> for an identical device prepared at 26&#x00B0;C, respectively. Magnetocurrent effect of ~28% was obtained with applied 2 T and 110&#x00B0;C.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6031923]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>160</startPage>
			<endPage>163</endPage>
			<fileSize>289</fileSize>
			<authors><![CDATA[bin Mohd Yusoff, A.R.;Ying Song;Holz, E.;Schulz, D.;Anuar Shuib, S.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Study of Memory Performance and Electrical Characteristics for Metal Nanocrystal Memories]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6035984]]></link>
			<description><![CDATA[Using a transient electrical model, in which the impacts of Si surface potential and thermal excitation were taken into account, the charging and discharging processes in a metal nanocrystal (NC) memory were simulated. For an NC memory with 2.25 nm tunnel oxide layer, the retention time is more than ten years, and the program and erase time can reach 45 and 60 &#x03BC;s at &#x00B1;10 V applied voltage, respectively. Moreover, the carrier storage effect caused by NCs has great influence on capacitance-voltage (C-V) characteristics. The flat-band voltage shift &#x0394;V<sub>FB</sub> and the charge density Q<sub>nc</sub> are greatly dependent on the start sweep gate voltage V<sub>G</sub> and the sweep rate dV/dt. The large memory window reveals the high carrier injection efficiency for both electrons and holes, and it increases steadily from 0.86 to 8.30 V with the increase of the start applied gate voltage from &#x00B1;2 to &#x00B1; 6 V. When the sweep rate is slow enough, the flat-band voltage shift and the stored charges will reach a saturation state. Hence, the simulation C-V characteristics of metal NC memory may guide the devices design or to predict their performances.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6035984]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>164</startPage>
			<endPage>171</endPage>
			<fileSize>777</fileSize>
			<authors><![CDATA[Pei-Hong Cheng;Shi-Hua Huang;Feng-Min Wu;]]></authors>
		</item>
		<item>
			<title><![CDATA[Bit-Cell Level Optimization for Non-volatile Memories Using Magnetic Tunnel Junctions and Spin-Transfer Torque Switching]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6035983]]></link>
			<description><![CDATA[Spin-transfer torque magnetic random access memories (STT-MRAM), using magnetic tunnel junctions (MTJ), is a resistive memory technology that has spurred significant research interest due to its potential for on-chip, high-density, high-speed, low-power, and non-volatile memory. However, due to conflicting read and write requirements, there is a need to develop optimization techniques for designing STT-MRAM bit-cells to minimize read and write failures. We propose an optimization technique that minimizes read and write failures by proper selection of bit-cell configuration and by proper access transistor sizing. A mixed-mode simulation framework was developed to evaluate the effectiveness of our optimization technique. Our simulation framework captures the transport physics in the MTJ using Non-Equilibrium Green's Function method and self-consistently solves the MTJ magnetization dynamics using Landau-Lifshitz-Gilbert equation augmented with the full Slonczewski spin-torque term. The electrical parameters of the MTJ are then encapsulated in a Verilog-A model and used in HSPICE to perform bit-cell level optimization. The optimization technique is applied to STT-MRAM bit-cells designed using 45 nm bulk and 45 nm silicon-on-insulator CMOS technologies. Finally, predictions are made for optimized STT-MRAM bit-cells designed in 16 nm predictive technology.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6035983]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>172</startPage>
			<endPage>181</endPage>
			<fileSize>1090</fileSize>
			<authors><![CDATA[Xuanyao Fong;Choday, S.H.;Roy, K.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Fault Models for Logic Circuits in the Multigate Era]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6032105]]></link>
			<description><![CDATA[With increased scaling to lower technology nodes, the electrostatic integrity of planar FETs is expected to worsen, necessitating the adoption of low-leakage high-performance multigate FETs, amongst which the FinFET is very attractive with respect to fabrication process complexity. A significant void from a circuit testing viewpoint is the absence of fault models for FinFETs. In particular, it is unclear if CMOS fault models are comprehensive enough to model all defects in FinFET circuits. We investigate the aforementioned problem using mixed-mode FinFET device simulation and demonstrate that while faults defined for planar FETs show significant overlaps with FinFETs, they do not encompass all regimes of operation. Results indicate that no single fault model can adequately capture the leakage-delay behavior of logic gates based on independent-gate FinFETs with opens on the back gate, and shorted-gate FinFETs, which have been accidentally etched into independent-gate structures. To this effect, we categorize back-gate cuts into three regimes where either pulse broadening or pulse shrinking occurs, which can be tested using three-/two-pattern delay fault tests.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6032105]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>182</startPage>
			<endPage>193</endPage>
			<fileSize>1983</fileSize>
			<authors><![CDATA[Bhoj, A.N.;Simsir, M.O.;Jha, N.K.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Blocking Charge Oscillation in a Series Array of Two Tiny Tunnel Junctions with a Resistive Ground Path from Its Island Electrode]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6032106]]></link>
			<description><![CDATA[The author demonstrates blocking charge oscillation in a series array of two tiny tunnel junctions with an island electrode having a resistive ground path. In the array, single-electron tunneling carries electric charge discretely into the island, while charge leakage through the resistive path to the ground reduces the island charge continuously. The combination of the discrete and continuous charge transfer eventually results in blocking oscillation of the island charge. Numerical Monte Carlo simulation demonstrates the blocking oscillation. Bias conditions for the blocking oscillation are analytically derived.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6032106]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>194</startPage>
			<endPage>199</endPage>
			<fileSize>579</fileSize>
			<authors><![CDATA[Mizugaki, Y.;]]></authors>
		</item>
		<item>
			<title><![CDATA[A Physical Channel Model and Analysis for Nanoscale Molecular Communications With F&#x00F6;rster Resonance Energy Transfer (FRET)]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6032753]]></link>
			<description><![CDATA[In this study, a novel and physically realizable nanoscale communication paradigm is introduced based on a well-known phenomenon, Fo&#x0308;rster resonance energy transfer (FRET), for the first time in the literature. FRET is a nonradiative energy transfer process between fluorescent molecules based on the dipole-dipole interactions of molecules. Energy is transferred rapidly from a donor to an acceptor molecule in a close proximity such as 0 to 10 nm without radiation of a photon. Low dependence on the environmental factors, controllability of its parameters, and relatively wide transfer range make FRET a promising candidate to be used for a high-rate nanoscale communication channel. In this paper, the simplest form of the FRET-based molecular communication channel comprising a single transmitter-receiver nanomachine pair and an extended version of this channel with a relay nanomachine for long-range applications are modeled considering nanomachines as nanoscale electromechanical devices with some sensing, computing, and actuating capabilities. Furthermore, using the information theoretical approach, the capacities of these communication channels are investigated and the dependence of the capacity on some environmental and intrinsic parameters is analyzed. It is shown that the capacity can be increased by appropriately selecting the donor-acceptor pair, the medium, the intermolecular distance, and the orientation of the molecules.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6032753]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>200</startPage>
			<endPage>207</endPage>
			<fileSize>520</fileSize>
			<authors><![CDATA[Kuscu, M.;Akan, O.B.;]]></authors>
		</item>
		<item>
			<title><![CDATA[Nanoparticle-Based Metamaterials as Multiband Plasmonic Resonator Antennas]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6081944]]></link>
			<description><![CDATA[Plasmonic metamaterials based on metal-dielectric nanostructures exhibit unique optical properties such as high near-field enhancement, negative refractive indexing, and optical cloaking. In this paper, we present a plasmonic multiband metamaterial based on UT shaped nanoparticles. In order to understand the multispectral response, we analyze the near-field distributions at the corresponding resonance frequencies. In addition, we both numerically and experimentally, show the dependence of the spectral response on the geometrical parameters of the structure. By embedding the system in a dielectric cladding medium, we show strong sensitivities of the resonant behavior to the refractive index and thickness of the dielectric load. Due to its tunable multiband spectral characteristics, the proposed metamaterial antenna can be used for wide range of applications, such as wavelength-tunable active filters, optical modulators, ultrafast switching devices, and biosensing.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6081944]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>208</startPage>
			<endPage>212</endPage>
			<fileSize>521</fileSize>
			<authors><![CDATA[Cetin, A.E.;Turkmen, M.;Aksu, S.;Altug, H.;]]></authors>
		</item>
		<item>
			<title><![CDATA[IEEE Transactions on Nanotechnology information for authors]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122894]]></link>
			<description><![CDATA[ ]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122894]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>C3</startPage>
			<endPage>C3</endPage>
			<fileSize>35</fileSize>
			<authors><![CDATA[]]></authors>
		</item>
		<item>
			<title><![CDATA[Blank page [back cover]]]></title>
			<link><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122892]]></link>
			<description><![CDATA[This page or pages intentionally left blank.]]></description>
			<pubDate><![CDATA[Jan.  2012]]></pubDate>
			<guid><![CDATA[http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=6122889&arnumber=6122892]]></guid>
			<volume>11</volume>
			<issue>1</issue>
			<startPage>C4</startPage>
			<endPage>C4</endPage>
			<fileSize>5</fileSize>
			<authors><![CDATA[]]></authors>
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