Photoluminescence study of the optically active, G-centre on pre-amorphised silicon by utilizing ion implantation technique

We report a new approach of generating the dicarbon G-centre on silicon substrates by utilizing technique that is fully compatible with the standard silicon ultra-large-scale integration (ULSI) technology. Silicon wafers were implanted with carbon and irradiated with high energy protons to produce self-interstitials that are crucial in the formation of the G-centre. Prior to that, all the samples were pre-amorphised with germanium. Photoluminescence (PL) measurements at 80 K were carried out to investigate the point defect mediated luminescence of the G-centre with a wavelength of 1280 nm. The results show a prominent, sharp luminescence at the carbon related, G centre in majority of the samples.