Large area line beam formation in Nissin ion doping system for TFT LCD fabrication

The Nissin ion doping system ID6700 for TFT LCD fabrication uses a large area ion source generating a uniform line beam which irradiates a large glass substrate. A uniform ion beam can be obtained across a large substrate over 600 mm, which is automatically tuned by individually adjusting the heating currents of the three filaments based on the beam profile data taken by a built-in multiple-slot Faraday array. The fraction of hydrogen ions in the beam has been successfully reduced to less than 10% by preventing the hydrogen ion extraction by applying a magnetically retarding configuration in the source plasma. A unique mass separation structure using permanent magnets has been placed close to the beam extraction system of the bucket type ion source to form a purified large area uniform beam to process the large glass substrate with high throughput.