Start up optimization for point of use filter in lithography process

For start up optimization of the point of use filter in lithography process, high flow dispensing and applying back pressure were revealed to be effective. The observed effectiveness of the high flow dispensing was confirmed valid in commercial test at NEC Yamagata Ltd., where remarkable reductions of BARC chemical consumption (70% reduction) and preventive maintenance time were proven. Additionally a measuring method to determine remaining air in the capsule filter developed in the study is also described.