The effects of head configuration on write resolution for submicron track recording

This paper presents a study of track edge writing phenomena with a view to achieving submicron track width longitudinal recording. Side written bands made by 1 /spl mu/m wide high-Bs FeTaN heads were compared with those by conventional NiFe thin film heads with the same width. Off-track overwrite experiments revealed that the balanced condition of the narrowed write gap and strong head fields by high-Bs poles suppressed the width of the degraded side written band and excessive erase band forming near the track edges. An analytical write modeling considering the non-saturation side writing process also showed that optimized narrow write gap along with strong head fields improved the write resolution throughout the narrow track.