Influence of substrate roughness on the formation of self-assembled monolayers (SAM) on Silicon [100]

We have investigated the relationship between surface roughness and morphology and the formation of self-assembled monolayers (SAM). Rough surfaces were prepared by abrading polished Si[100] wafers with SiC paper. Dodecan (-C/sub 12/H/sub 25/) SAM were prepared by refluxing the samples in a 30% dodecene solution in mesithylene. The FTIR spectra of these samples were analyzed with respect to the CH/sub 2/- and CH/sub 3/- peak positions, peak intensities and peak widths.