Electrical and geometrical properties of a Si quantum nanowire device fabricated by an inorganic EB resist process

Recently, ultra-small Si devices utilizing a quantum-size and/or Coulomb blockade effect have been received much attention to open a new Si device stream. This paper describes both electrical and geometrical properties of a Si quantum device with a Si nanowire channel fabricated by using an inorganic EB resist process. Especially, the physical structure of the Si quantum nanowire has well been investigated by TEM observation for the first time.