Spin stand study of density dependence of switching proprieties in patterned media

The recording processes of patterned bits with different bit length generated by focused ion beam etching are investigated by spin stand testing. Compared to conventional written transitions, the magnetization switching of patterned bits requires much smaller write fields. Also the write field gradient is no longer critical to the sharpness of the transition of patterned bits. Experimental results demonstrate that from the standpoint of recording, patterned media is a good solution for ultra-high density magnetic recording.