Studying Knotless Screen Patterns for Fine-line Screen Printing of Si-Solar Cells

Flatbed screen printing is the dominating process in industry for metallization of silicon solar cells. It offers high throughput rates, high flexibility of printing pattern, and an overall very cost-effective production compared with other printing technologies. However, the ongoing demand for an optimization of printed silver electrode shape creates an increasing challenge to paste and screen development. The recent trend of so called “knotless” screens with a screen angle of 0° offers an increased paste transfer, therefore, better electrode conductivity, which leads to an improved solar cell efficiency. The disadvantage of this screen architecture is a reduced screen lifetime and low production yield. This article presents a systematic simulation of screen pattern to investigate screen angles, which allow for an improved knotless screen architecture. Therefore, different types of wire crossings have been defined, simulated, and experimentally verified by microscope images. For example, when 14.036°, 18.435°, and 26.565° are used, knotless screen pattern openings emerge without showing any of the disadvantages of regular 0°-knotless screens. For this reason, statistical screen lifetime estimations are carried out by modeling the intersection lengths of all mesh wires and the emulsion edge across the screen opening. Furthermore, a detailed analysis on manufacturing tolerances is given, showing that the 26.565° screen angle offers the best compromise between challenges during manufacturing and potential performance in production of Si-solar cells.