A 0.35 /spl mu/m SiGe BiCMOS process featuring a 80 GHz f/sub max/ HBT and integrated high-Q RF passive components

A SiGe HBT, fabricated by means of selective epitaxy, and high-Q RF passive components have been integrated into a 0.35 /spl mu/m BiCMOS process. The HBT features an f/sub T/ of 50 GHz and f/sub max/ of 80 GHz at V/sub BC/=2 V. The npn transistors are integrated in a 0.35 /spl mu/m CMOS process with poly resistors, MIM capacitors and thick metal 4 on chip spiral inductors.