Junction breakdown instabilities in deep trench isolation structures

Junction breakdown voltage instability in a p-n junction formed in bulk silicon adjacent to a deep trench filled with polysilicon was investigated. The structure investigated consists of a 5- mu m-deep trench filled with heavily p-doped polysilicon. The trench is open at the bottom and is consequently shorted to the p-substrate. The time-dependent behavior of the walkout or the breakdown voltage instability is similar to that reported for planar p-n junctions terminating on surface oxide. Results suggest that trapping of holes in the trench sidewall dielectric is responsible for this phenomenon. The product of trapping center concentration and capture cross section N sigma is estimated to be 90 cm/sup -1/.<
>