Mechanical and electrical characteristics of polysilicon film deposited by new LPCVD using lamp heating

The newly developed LPCVD apparatus using lamp heating was shown to be valid for obtaining the same polysilicon film for micromachines as that produced by the conventional LPCVD apparatus, by analysing the metallurgical properties of the polysilicon film deposited by the new LPCVD apparatus. However, when producing a micromachine using the polysilicon film deposited with this apparatus, it is necessary to know the mechanical and electrical characteristics of the film. Therefore, this report describes the analysis of Young's modulus, resistivity and gauge factor of polysilicon deposited by the new LPCVD apparatus.