Advanced in-situ particle monitor for Applied Materials implanter applications

In-situ particle monitors offer significant benefits in cost of ownership for ion implant applications. Particle excursions and out-of-control conditions are detected and alarmed as they occur, minimizing the potential for scrapping future product runs. Applied Materials are now qualifying an advanced technology in-situ particle sensor for the xR80 series and xR200S (9500 series) implanters. Utilizing Particle Measuring Systems, Inc. Technology, this system directly addresses the historical limitations with in-situ particle monitors. Electronic and thermally sensitive components are kept out of the processor chamber. Very high optical power is generated in the sensor, detecting particles as small as 0.08 /spl mu/m at velocities up to 10 m/s. Testing to date indicates this sensor offers excellent performance in monitoring particle excursions and a good correlation to small particles counted on wafers.