Dielectric charging model for metal-insulator-metal structures

One of the challenges in the microelectronic field is to improve the component reliability. In this work dielectric charging process in capacitive structures under bias voltage is particularly investigated. A new dielectric charging model to study charge accumulation in insulator thin films is presented. It allows a better understanding of charge transport mechanisms and physical charging process in dielectrics. This model will contribute to estimate and improve the lifetime of devices containing a dielectric thin film.