Structural colours via metal free disordered nanostructures with nm resolution and full CYMK colour spectrum

Summary form only given. Engineering colors through optical properties of nanostructures represents a research area of great interest, due to the many applications that can be enabled by this technology, from adaptive camouflage to micro-images for security and biomimetic materials [1-4].In this work we develop a novel technique based on random structure patterning by means of electron beam lithography, able to generate all the fundamental colours with a simple, scalable, low cost and metal-free procedure. Engineering the scattering from complex media already demonstrated to be a successful in creating ultra-black material and new type of sources for optical applications [5]. Our new approach realises the fundamental colors of the CMYK (Ciano, Magenta, Yellow and Black) system, and therefore is able to represent any color in the spectrum, including variations in intensity.